Ten years ago, when the industry was struggling to deliver EUV lithography, directed self-assembly (DSA) roared to the forefront of research and development for virtually every manufacturer determined ...

Nanoimprint lithography (NIL) is an advanced nanofabrication technique capable of creating patterns and structures smaller than 10 nm with low cost, high throughput ...

The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...

Applied Materials has launched the SEMVision™ H20, a new defect review system designed to enhance the analysis of nanoscale defects in advanced semiconductor chips. This system utilizes cutting-edge ...

Altatech Semiconductor has entered the LED inspection market with the introduction of the AltaSight LEDMax system, which is designed to detect, classify, and characterize defects on wafers used in ...

(Nanowerk News) Standard manufacturing techniques for semiconductor devices – the technologies that make electronics possible – involve processing raw materials at high temperatures in vacuum vessels.

A new solution deposition process for semiconductors yields high-performing transistors by introducing more defects, counterintuitively. Researchers used these devices to construct high- speed logic ...